Introductory
7/31
PVD (Physical vapor deposition) ­ Pros
·No reacted chemical exhaustion, no contamination,
·During process, only atmospheric gas or inert gas is
used.
·Low process temperature and easy control,
·Process temperature is usually less than 300 °C,
which might be suitable for polymer samples.
·Good continuity,
·Depends on tool layout, multiple layer can be
continuously deposited by shifting sample or target
without breaking vacuum.
·Less substrate limitation,
·Normally all kinds of substrate can be use in PVD
system.

---